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  • Monday
  • Beware of Artifacts When Characterizing Nanometer Device Features Smaller Than a TEM Lamella Thickness in Semiconductor Wafer-foundries

    • Wayne Zhao ;
    • Hugh Porter ;
    • Raghaw Rai ;
    • Esther Chen ;
    • Jeremy Russell ;
    Title: Beware of Artifacts When Characterizing Nanometer Device Features Smaller Than a TEM Lamella Thickness in Semiconductor Wafer-foundries
    Wayne Zhao;Hugh Porter;Raghaw Rai;Esther Chen;Jeremy Russell

    Symposium: A16 - Correlative Microscopy and Microanalysis from Macro to Pico
    Date and Time: Tuesday, Aug 5 3:30 PM - 5:00 PM
    Room: CCC - Exhibit Hall AB